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Comparison of the removal efficiency for organic contaminants on silicon wafers stored in plastic boxes between UV/O3 and ECR oxygen plasma cleaning methods

✍ Scribed by Kyunsuk Choi; Tae-Jong Eom; Chongmu Lee


Book ID
108388642
Publisher
Elsevier Science
Year
2003
Tongue
English
Weight
502 KB
Volume
435
Category
Article
ISSN
0040-6090

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