Reliability of SiO2 and high-k gate insu
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M. Porti; L. Aguilera; X. Blasco; M. NafrΔ±Β΄a; X. Aymerich
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Article
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2007
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Elsevier Science
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English
β 357 KB
In this work, a conductive atomic force microscope (C-AFM) is used to study the reliability (degradation and breakdown, BD) of SiO 2 and high-k dielectrics. The effect of a current limit on the post-BD SiO 2 electrical properties at the nanoscale is discussed. In particular, the impact of a current