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Reliability of thermally oxidized SiO2/4H-SiC by conductive atomic force microscopy

✍ Scribed by Fiorenza, Patrick; Raineri, Vito


Book ID
118116932
Publisher
American Institute of Physics
Year
2006
Tongue
English
Weight
403 KB
Volume
88
Category
Article
ISSN
0003-6951

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In this work, a conductive atomic force microscope (C-AFM) is used to study the reliability (degradation and breakdown, BD) of SiO 2 and high-k dielectrics. The effect of a current limit on the post-BD SiO 2 electrical properties at the nanoscale is discussed. In particular, the impact of a current