Reliability degradation of thin HfO2/SiO2 gate stacks by remote RF hydrogen and deuterium plasma treatment

✍ Scribed by E. Efthymiou; S. Bernardini; J.F. Zhang; S.N. Volkos; B. Hamilton; A.R. Peaker

• Book ID: 108290175
• Publisher: Elsevier Science
• Year: 2008
• Tongue: English
• Weight: 243 KB
• Volume: 517
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/j.tsf.2008.08.051