𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Relaxation of strain during solid phase epitaxial growth of Ge+ ion implanted layers in silicon

✍ Scribed by G. Holmén; Prayoon Songsiriritthigul


Book ID
114170316
Publisher
Elsevier Science
Year
1998
Tongue
English
Weight
695 KB
Volume
143
Category
Article
ISSN
0168-583X

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES