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Relationship Between Thermal Stability and Optical Bandgap of Fluorinated Amorphous Carbon Films

✍ Scribed by Shen-dong, Yang; Zhao-yuan, Ning; Feng, Huang; Shan-hua, Cheng; Chao, Ye

Book ID
120374107
Publisher
IOP Publishing
Year
2001
Tongue
English
Weight
340 KB
Volume
3
Category
Article
ISSN
1009-0630

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Fluorinated amorphous carbon films (a-F : C) were deposited by high-density plasma-chemical vapor deposition (HDP-CVD) using C 4 F 8 and CH 4 as precursors. The deposition process was performed at two temperatures: $200 and $3508C. In order to study the thermal stability of the films, the samples we