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Influence of thermal annealing on bonding structure and dielectric properties of fluorinated amorphous carbon film

✍ Scribed by Zhaoyuan Ning; Shanhua Cheng; Shendong Yang

Publisher
Elsevier Science
Year
2002
Tongue
English
Weight
100 KB
Volume
2
Category
Article
ISSN
1567-1739

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Fluorinated amorphous carbon films (a-F : C) were deposited by high-density plasma-chemical vapor deposition (HDP-CVD) using C 4 F 8 and CH 4 as precursors. The deposition process was performed at two temperatures: $200 and $3508C. In order to study the thermal stability of the films, the samples we