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Reduction of Boron Diffusion in Silicon–Germanium by Fluorine Implantation

✍ Scribed by H. Elmubarek; P. Ashburn

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Suppression of boron transient enhanced

✍ H.A.W. El Mubarek; Y. Wang; R. Price; J.M. Bonar; J. Zhang; P.L.F. Hemment; P. A 📂 Article 📅 2005 🏛 Elsevier Science 🌐 English ⚖ 474 KB

Effect of Fluorine Co-Implant on Boron D

✍ Chyiu Hyia Poon; See, A. 📂 Article 📅 2011 🏛 IEEE 🌐 English ⚖ 321 KB

Reduction of boron transient enhanced di

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Quadrupole interactions of fluorine at i

✍ K. Bonde Nielsen; T. Lauritsen; G. Weyer; H. K. Schou; P. T. Nielsen 📂 Article 📅 1983 🏛 Springer 🌐 English ⚖ 184 KB

Anomalous diffusion of implanted boron i

✍ Bao, Xi-Mao ;Hua, Xue-Mei 📂 Article 📅 1991 🏛 John Wiley and Sons 🌐 English ⚖ 290 KB

Implantation damage and anomalous diffus

✍ Guo, Qiang; Bao, Ximao; Hong, Jianming; Yan, Yong; Feng, Duan 📂 Article 📅 1989 🏛 American Institute of Physics 🌐 English ⚖ 545 KB

Reduction of Boron Diffusion in Silicon&#8211;Germanium by Fluorine Implantation