𝔖 Bobbio Scriptorium
✦   LIBER   ✦

Recrystallization of boron-doped and undoped preamorphized silicon layers by rapid and conventional thermal annealing

✍ Scribed by J. Fauré; A. Claverie; L. Laanab; P. Bonhomme


Publisher
Elsevier Science
Year
1994
Tongue
English
Weight
534 KB
Volume
22
Category
Article
ISSN
0921-5107

No coin nor oath required. For personal study only.


📜 SIMILAR VOLUMES