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Real-time monitor for thin film etching in atomic oxygen environments

✍ Scribed by E.B.D. Bourdon; R.H. Prince; W.D. Morison; R.C. Tennyson


Book ID
107930232
Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
624 KB
Volume
52
Category
Article
ISSN
0257-8972

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The versatile multichannel process monitor system, MPM-X, designed for the online control of plasma and ion beam etching and deposition is introduced. It provides a number of in situ process data like etch rate and selectivity, deposition rate, film thickness, uniformity and endpoint. This is achiev