Reactivity and molecular structure of silicon-oxygen-carbon-containing films derived from organometallic chemical vapor deposition (OMCVD)

✍ Scribed by Terence J. Clark

• Book ID: 116175604
• Publisher: Elsevier Science
• Year: 1996
• Tongue: English
• Weight: 390 KB
• Volume: 34
• Category: Article
• ISSN: 1359-6462
• DOI: 10.1016/1359-6462(95)00602-8