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Reactive ion etching of multilayer mirrors for X-ray projection lithography masks

✍ Scribed by C.Khan Malek; F.R. Ladan; M. Carré; R. Rivoira

Publisher: Elsevier Science
Year: 1991
Tongue: English
Weight: 375 KB
Volume: 13
Category: Article
ISSN: 0167-9317
DOI: 10.1016/0167-9317(91)90094-t

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