Reactive ion etching in microcircuit fabrication
β Scribed by P.M. Schaible; G.C. Schwartz
- Publisher
- Elsevier Science
- Year
- 1981
- Tongue
- English
- Weight
- 91 KB
- Volume
- 83
- Category
- Article
- ISSN
- 0040-6090
No coin nor oath required. For personal study only.
π SIMILAR VOLUMES
We have studied the fabrication of high-aspect ratio silicon tips by a combination of deep reactive ion etching and focused ion beam. The reactive ion etching is used to obtain so-called "rocket tips" which can be fabricated with a high aspect ratio. The rocket tips are further processed by using a
Ti-indiffused LiNbO 3 waveguides have been used for various high speed optical devices, such as modulators, switches and sensors, because of their electro-optic effect. In order to broaden the modulation bandwidth of an optical modulator above 10 GHz, both impedance matching and optical and RF phase
Self-encapsulated nickel microchannels and nickel nanowalls were fabricated with a new approach using reactive ion etching (RIE) process. The simple microfabrication process consists of nickel deposition, lithography, nickel RIE, and plasma ashing. Well-aligned nickel nanowalls and nickel self-encap