Reactive-ion-etch damage in GaAs processing evaluated by a microwave absorption technique

✍ Scribed by Hans P. Zappe; Gudrun Kaufel

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 321 KB
• Volume: 50
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/0169-4332(91)90184-l