𝔖 Bobbio Scriptorium
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Reactive direct current magnetron sputtering of aluminum oxide coatings

✍ Scribed by Sproul, W. D.

Book ID
125430262
Publisher
AVS (American Vacuum Society)
Year
1995
Tongue
English
Weight
329 KB
Volume
13
Category
Article
ISSN
0734-2101

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Over the past 10 years, there have been three major advancements in reactive sputtering technology that now make it possible to deposit both conductive and non-conductive fully-dense films at high rates. These three advances are unbalanced magnetron sputtering, partial pressure control of the reacti