Over the past 10 years, there have been three major advancements in reactive sputtering technology that now make it possible to deposit both conductive and non-conductive fully-dense films at high rates. These three advances are unbalanced magnetron sputtering, partial pressure control of the reacti
High-rate pulsed reactive magnetron sputtering of oxide nanocomposite coatings
โ Scribed by Musil, Jindrich; Baroch, Pavel
- Book ID
- 120508701
- Publisher
- Elsevier Science
- Year
- 2013
- Tongue
- English
- Weight
- 942 KB
- Volume
- 87
- Category
- Article
- ISSN
- 0042-207X
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