Reactive chemical vapour deposition (RCVD) of non-volatile terbium aromatic carboxylate thin films
✍ Scribed by Kotova, Oxana V.; Utochnikova, Valentina V.; Samoylenkov, Sergey V.; Rusin, Alexander D.; Lepnev, Leonid S.; Kuzmina, Natalia P.
- Book ID
- 115486829
- Publisher
- Royal Society of Chemistry
- Year
- 2012
- Tongue
- English
- Weight
- 679 KB
- Volume
- 22
- Category
- Article
- ISSN
- 0959-9428
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Volatile precursors of copper, silver and gold for chemical vapour deposition (CVD) of metallic layers are described. There is considerable research interest in CVD because it provides advantages such as selective deposition, control of film density and thickness, etc. over other physical deposition
## Abstract The monomeric tungsten oxo‐fluoroalkoxide W(O)(CH~2~CF~3~)~4~ (1) was synthesized from W(O)Cl~4~ and CF~3~CH~2~OH in the presence of ammonia. It was used in atmospheric pressure chemical vapour deposition experiments to deposit non‐stoichiometric WO~2.9~ when used as a single‐source pre