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Rapid thermal stability of refractory metal and silicide contacts on p-InP

✍ Scribed by Eftekhari, G.

Publisher
John Wiley and Sons
Year
1994
Tongue
English
Weight
372 KB
Volume
143
Category
Article
ISSN
0031-8965

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## Abstract The effects of rapid thermal annealing on the electrical and structural properties of Pd/Au Schottky contacts to n‐type InP(111) have been investigated by current–voltage (__I__ –__V__), capacitance–voltage (__C__ –__V__) and X‐ray diffraction (XRD) measurements. The barrier height of t