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Rapid thermal annealing of YBaCuO thin films sputtered on SiO2Si3N4Si substrates

โœ Scribed by J. Baixeras; F. Carrie; F.Hosseini Teherani; A. Kreisler

Book ID
116017787
Publisher
Elsevier Science
Year
1990
Weight
396 KB
Volume
164-165
Category
Article
ISSN
0022-5088

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Effect of rapid thermal annealing on Si
Effect of rapid thermal annealing on Si rich SiO2 films prepared using atom beam sputtering technique
โœ Trupti N. Warang; D. Kabiraj; D.K. Avasthi; K.P. Jain; K.U. Joshi; A.M. Narsale; ๐Ÿ“‚ Article ๐Ÿ“… 2009 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 444 KB

We report here the synthesis of silicon-nanoclusters embedded in SiO 2 by atom beam co-sputtering technique. A sputtering target consisted of 40% and 60% area of Si pieces glued on a fused silica plate. A cosputtered film containing Si embedded in SiO 2 having different compositional fractions of Si