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Rapid thermal annealing of WSix: In-situ resistance measurements

✍ Scribed by C. Nobili; M. Bosi; G. Ottaviani; G. Queirolo; L. Bacci

Publisher
Elsevier Science
Year
1991
Tongue
English
Weight
460 KB
Volume
53
Category
Article
ISSN
0169-4332

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## Grain growth in CdTe films was studied by rapid thermal annealing of films prepared by co-deposition (at room temperature) of CdTe and Cd& Annealing conditions were varied to optimize the post-deposition heat treatment for obtaining CdTe films with larger grains. It was found that it is possible