Rapid oxidation of silicon using 126 nm excimer radiation at low pressure

✍ Scribed by Q. Fang; Jun-Ying Zhang; Ian W. Boyd

• Book ID: 108417960
• Publisher: Elsevier Science
• Year: 2003
• Tongue: English
• Weight: 144 KB
• Volume: 208-209
• Category: Article
• ISSN: 0169-4332
• DOI: 10.1016/s0169-4332(02)01403-4