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Low Temperature Photochemical Vapor Deposition of SiO 2 Using 172 nm Xe 2 * Excimer Lamp Radiation with Three Oxidant Chemistries: O 2 , H 2 O/O 2 , and H 2 O 2

✍ Scribed by Roland, Randa Pfeifer; Bolle, Matthias; Anderson, Roger W.

No coin nor oath required. For personal study only.

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