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Theoretical Modeling of SiO 2 Photochemical Vapor Deposition and Comparison to Experimental Results for Three Oxidant Chemistries: SiH 4 + O 2 , H 2 O/O 2 , and H 2 O 2

✍ Scribed by Roland, Randa Pfeifer; Anderson, Roger W.

No coin nor oath required. For personal study only.

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