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Range distribution characteristics of H+ and He++ ions with energies (5 to 2) × 103 keV implanted into silicon

✍ Scribed by Akkerman, A. F. ;Akkerman, S. A.

Publisher: John Wiley and Sons
Year: 1981
Tongue: English
Weight: 390 KB
Volume: 68
Category: Article
ISSN: 0031-8965
DOI: 10.1002/pssa.2210680109

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