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Raman study of silicon nanocrystals formed in SiNx films by excimer laser or thermal annealing

✍ Scribed by Volodin, V. A.; Efremov, M. D.; Gritsenko, V. A.; Kochubei, S. A.


Book ID
118015792
Publisher
American Institute of Physics
Year
1998
Tongue
English
Weight
380 KB
Volume
73
Category
Article
ISSN
0003-6951

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