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Raman scattering in amorphous silicon films

✍ Scribed by L.P. Avakyants; L.L. Gerasimov; V.S. Gorelik; N.M. Manja; E.D. Obraztsova; Yu.I. Plotnikov


Publisher
Elsevier Science
Year
1992
Tongue
English
Weight
374 KB
Volume
267
Category
Article
ISSN
0022-2860

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Amorphous silicon, a-Si, thin films were prepared from SiH, by plasma glow discharge. Film characterization was accomplished using ir and -vfi optical measurements. Differences observed in the energy gap values, optically and photoelectrochemically determined, were correlated with the substrate temp