Quenching of FSO3(B̃2E) generated by 193 nm photodissociation of FSO2OF and F2S2O6

✍ Scribed by C.J. Cobos; A.E. Croce; E. Castellano

• Publisher: Elsevier Science
• Year: 1991
• Tongue: English
• Weight: 631 KB
• Volume: 59
• Category: Article
• ISSN: 1010-6030
• DOI: 10.1016/1010-6030(91)87002-d

✦ Synopsis

The collisional relaxation of electronically excited FS03 radicals, generated by laser photodissociation of FSO,OF and F&Oh at 193 nm, was studied by examination of the absorption rise profiles due to the appearance of ground state vibrationally excited FSO, radicaIs. Room temperature quenching rate constants for collision partners He, N1, 02, Cl,, CO*, CF.,, FSOtOF and F&O6 were measured (in units of lo9 dm3 mol-' s-l); they are 2.0+0.2, 1.4*0.2, 1.6f0.2, 3.6*0.4, 3.2kO.4, 2.7f0.4, llfl and 20*2 respectively. Both precursors employed yield electronically excited radicals with essentially the same kinetic properties and a radiative lifetime (4.2f 0.5 E,LS) which agrees very well with that evaluated from the integrated oscillator strength for the B*E state of the FS03 radical. The ex erimental quenching cross-sections are well correlated with the well depth of the FS03( g 'E)-quencher interaction.