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Quantitative depth profiling of photoacid generators in photoresist materials by near-edge X-ray absorption fine structure spectroscopy

✍ Scribed by Vivek M. Prabhu; Sharadha Sambasivan; Daniel Fischer; Linda K. Sundberg; Robert D. Allen

Publisher: Elsevier Science
Year: 2006
Tongue: English
Weight: 571 KB
Volume: 253
Category: Article
ISSN: 0169-4332
DOI: 10.1016/j.apsusc.2006.03.089

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