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Quantitative Auger electron spectroscopy in thin film depth profiling

โœ Scribed by Siegfried Hofmann

Book ID
108390361
Publisher
Elsevier Science
Year
1997
Tongue
English
Weight
627 KB
Volume
48
Category
Article
ISSN
0042-207X

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The advantages of ion etching over wet chemical etching are demonstrated, e,g. structure resolution in the region of the etching depth, no undercutting, excellent reproducibility and high adherence of small striplines.