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Quantitative Auger analysis of silicides

✍ Scribed by T Wirth; M Procop; H Lange


Publisher
Elsevier Science
Year
1986
Tongue
English
Weight
254 KB
Volume
36
Category
Article
ISSN
0042-207X

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Quantitative AES analysis of TiSi x (1.3 ≀ x ≀ 2.1) thin films deposited on silicon by co-sputtering in a magnetron system has been performed. The time variation of the surface composition during sputtering with Ar Y ions of 3 keV energy has been explained using a kinetic model that allows one to de