Quantitative AES analysis of TiSi x (1.3 โค x โค 2.1) thin films deposited on silicon by co-sputtering in a magnetron system has been performed. The time variation of the surface composition during sputtering with Ar Y ions of 3 keV energy has been explained using a kinetic model that allows one to de
โฆ LIBER โฆ
Auger quantitative analysis and preferential sputtering in brass alloys
โ Scribed by F. Marchetti; M. Dapor; S. Girardi; M. Cipparrone; P. Tiscione
- Publisher
- Elsevier Science
- Year
- 1990
- Tongue
- English
- Weight
- 295 KB
- Volume
- 41
- Category
- Article
- ISSN
- 0042-207X
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An analysis of the correlation of theoretical predictions for Auger electron intensities is made with the experimental data of the high-resolution digital Auger database. This analysis covers single-element samples measured for 5 keV and 10 keV beam energies. The spectral data are for wide scans of