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Pulsed laser deposition of hydroxylapatite thin films on Ti-6Al-4V

✍ Scribed by Dr. Catherine M. Cotell; Douglas B. Chrisey; Kenneth S. Grabowski; James A. Sprague; Charles R. Gossett

Publisher: Wiley (John Wiley & Sons)
Year: 1992
Tongue: English
Weight: 729 KB
Volume: 3
Category: Article
ISSN: 1045-4861
DOI: 10.1002/jab.770030204

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✦ Synopsis

Pulsed laser deposition was used to deposit thin films of calcium hydroxylapatite (Calo(P04)6(OH)z), or HA, on polished substrates of Ti-6A1-4V. Thin films of pure, crystalline HA, uncontaminated by other calcium phosphate phases, were deposited over a range of temperatures between 400 and 800 "C. The HA films were polycrystalline with a preferred (001) crystallographic orientation, as determined by transmission electron microscopy and x-ray diffraction. Adhesion of the HA films to the Ti-6A1-4V substrates was excellent when films were deposited at temperatures 5 600 "C; in a scratch test, mean pressures of ca. 10'' Nm-' produced conformational cracking in a film deposited at 600 "C, but no decohesion from the substrates.

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