The Deposition of Diamond Films by Combustion Assisted CVD on Ti and Ti-6Al-4V
✍ Scribed by S. H. Baek; D. F. Mihec; J. B. Metson
- Publisher
- John Wiley and Sons
- Year
- 2002
- Tongue
- English
- Weight
- 479 KB
- Volume
- 8
- Category
- Article
- ISSN
- 0948-1907
No coin nor oath required. For personal study only.
✦ Synopsis
Combustion assisted (CA) CVD is one of a range of CVD methods that have been used successfully to grow diamond films on a range of substrates. Of critical interest is the role of interfacial carbides in the nucleation and adhesion of diamond at the substrate/film interface. Deposition experiments with substrates including titanium and its alloys, suggest the nature of the substrate is important in aiding carbide and subsequently diamond formation. The formation of a stable carbide clearly assists in the nucleation phase and in enhancing bonding at the interface, but it is far from clear that it is an essential precursor to the formation of diamond. Rather it appears to stabilize the substrate surface while diamond growth is established. On the other hand, refractory oxide films accelerate deposition by aiding in the stabilization of the substrate surface under the combustion flame, but are ultimately deleterious to film bonding because of the weakened bonding and increased lattice mismatch with the overlying diamond.