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Pulsed Excimer Laser Crystallization of Evaporated Amorphous Silicon Films. The Role of SiO2 Underlayer Thickness

✍ Scribed by Luby, S. ;Jergel, M. ;Majkova, E. ;D'anna, E. ;Luches, A. ;Martino, M. ;Brunel, M. ;Vavra, I.


Publisher
John Wiley and Sons
Year
1996
Tongue
English
Weight
658 KB
Volume
154
Category
Article
ISSN
0031-8965

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