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Properties of a-Si : H : F deposited in SiF4/SiH4/Ar Gas mixtures by a glow-discharge technique

✍ Scribed by S. Usui; A. Sawada; M. Kikuchi

Book ID: 118331056
Publisher: Elsevier Science
Year: 1980
Tongue: English
Weight: 378 KB
Volume: 41
Category: Article
ISSN: 0022-3093
DOI: 10.1016/0022-3093(80)90160-x

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