## Abstract Micromechanical 3C‐SiC‐ and AlN‐resonator beams with resonant frequencies between 20 kHz and 5 MHz have been realized. The 200 nm thin epitaxial SiC and group III‐nitrides layers were grown on silicon (100) and (111) oriented substrates, respectively. Subsequent the beams were dry‐etche
Processing of novel SiC and group III-nitride based micro- and nanomechanical devices
✍ Scribed by Foerster, Ch. ;Cimalla, V. ;Brueckner, K. ;Lebedev, V. ;Stephan, R. ;Hein, M. ;Ambacher, O.
- Publisher
- John Wiley and Sons
- Year
- 2005
- Tongue
- English
- Weight
- 201 KB
- Volume
- 202
- Category
- Article
- ISSN
- 0031-8965
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✦ Synopsis
Abstract
Micro‐ and nanoelectromechanical systems are being designed and intensively investigated for their use in various sensor applications. In this issue's Editor's Choice [1] micromechanical resonator beams with high fundamental frequencies were realized. The cover picture shows a scanning electron microscopy image of a 3C–SiC beam with middle electrode for capacitive read‐out as well as a finite element method simulation of the maximum oscillation amplitude.
The first author, Christian Förster, works on the epitaxial growth of hetero‐ and nanostructures based on wide band gap semiconductors and the processing of electronic and sensor devices in the Center for Micro‐ and Nanotechnologies of the Technical University Ilmenau, Germany.
The present issue of physica status solidi (a) contains Original Papers presented at the 7th International Workshop on Expert Evaluation & Control of Compound Semiconductor Materials & Technologies held in Montpellier, France, 1–4 June 2004. Further papers from EXMATEC 2004 are published in physica status solidi (c) 2, No. 4 (2005). (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
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