Processing and Properties of Compound Semiconductors

✍ Scribed by R. Willardson and H.S. Nalwa (Eds.)

• Publisher: Elsevier, Academic Press
• Year: 2001
• Tongue: English
• Leaves: 333
• Series: Semiconductors and Semimetals 73
• Category: Library

✦ Synopsis

Since its inception in 1966, the series of numbered volumes known as Semiconductors and Semimetals has distinguished itself through the careful selection of well-known authors, editors, and contributors. The Willardson and Beer series, as it is widely known, has succeeded in producing numerous landmark volumes and chapters. Not only did many of these volumes make an impact at the time of their publication, but they continue to be well-cited years after their original release. Recently, Professor Eicke R. Weber of the University of California at Berkeley joined as a co-editor of the series. Professor Weber, a well-known expert in the field of semiconductor materials, will further contribute to continuing the series' tradition of publishing timely, highly relevant, and long-impacting volumes. Some of the recent volumes, such as Hydrogen in Semiconductors, Imperfections in III/V Materials, Epitaxial Microstructures, High-Speed Heterostructure Devices, Oxygen in Silicon, and others promise that this tradition will be maintained and even expanded.

✦ Table of Contents

Content:
List of contributors
Page ix

Chapter 1 Introduction
Pages 1-13
S.J. Pearton

Chapter 2 Gallium arsenide heterostructures Original Research Article
Pages 15-62
Eric Donkor

Chapter 3 Growth and optical properties of GaN Original Research Article
Pages 63-150
Annamraju Kasi Viswanath

Chapter 4 SiGe/Si processing Original Research Article
Pages 151-197
D.Y.C. Lie, K.L. Wang

Chapter 5 Advances in quantum dot structures Original Research Article
Pages 199-213
S. Kim, M. Razeghi

Chapter 6 Wet etching of III–V semiconductors Original Research Article
Pages 215-295
Walter P. Gomes

Index
Pages 297-299

Contents of volumes in this series
Pages 301-321