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Processing and characterization of a-Si:H photoresists for a vacuum-compatible photolithography process

✍ Scribed by R. N. Jacobs; A. J. Stoltz; E. W. Robinson; P. R. Boyd; L. A. Almeida; J. H. Dinan; L. Salamanca-Riba

No coin nor oath required. For personal study only.

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