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An a-Si:H vacuum-compatible photoresist process for fabricating device structures in HgCdTe

✍ Scribed by R. E. Hollingsworth; C. Dehart; Li Wang; J. N. Johnson; J. D. Benson; J. H. Dinan

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Processing and characterization of a-Si:

✍ R. N. Jacobs; A. J. Stoltz; E. W. Robinson; P. R. Boyd; L. A. Almeida; J. H. Din 📂 Article 📅 2004 🏛 Springer US 🌐 English ⚖ 576 KB