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Process control of plasma nitriding and plasma nitrocarburizing in industry

✍ Scribed by W. Rembges; W. Oppel


Book ID
107930249
Publisher
Elsevier Science
Year
1993
Tongue
English
Weight
989 KB
Volume
59
Category
Article
ISSN
0257-8972

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Al?~ract --Despite its widespread use, plasma etching remains a poorly understood operation. Using chromatic monitor to measure key plasma parameters, the etch process was characterised using response surface methodology. In order to develop control-oriented models, open-loop dynamic testing was car