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Process control of magnetron sputtering of TiN coatings studied by in situ AES and plasma diagnostics

✍ Scribed by R. Roth; J. Schubert; E. Fromm

Publisher: Elsevier Science
Year: 1995
Tongue: English
Weight: 562 KB
Volume: 74-75
Category: Article
ISSN: 0257-8972
DOI: 10.1016/0257-8972(95)08249-2

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