Effect of process parameter changes on the composition of magnetron sputtered and evaporated TiN and AlN films measured by UHV in-situ techniques

✍ Scribed by R. Roth; J. Schubert; M. Martin; E. Fromm

• Publisher: Elsevier Science
• Year: 1995
• Tongue: English
• Weight: 518 KB
• Volume: 270
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(95)06935-6