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Process and Characteristics of Fully Silicided Source/Drain (FSD) Thin-Film Transistors

✍ Scribed by Chia-Pin Lin; Yi-Hsuan Hsiao; Bing-Yue Tsui


Book ID
114618520
Publisher
IEEE
Year
2006
Tongue
English
Weight
859 KB
Volume
53
Category
Article
ISSN
0018-9383

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## Abstract Indium tin oxide (ITO) has been used as the prefered electrode material for the emerging area of transparent electronics, namely for thin‐film transistors (TFTs) based on oxide semiconductors. This work pretends to investigate different materials to replace ITO in inverted‐staggered TFT