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Problems in the physical vapour deposition of titanium nitride

โœ Scribed by A. Matthews; A.R. Lefkow

Publisher
Elsevier Science
Year
1985
Tongue
English
Weight
632 KB
Volume
126
Category
Article
ISSN
0040-6090

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โœ S.J. Bull; P.R. Chalker; C.F. Ayres; D.S. Rickerby ๐Ÿ“‚ Article ๐Ÿ“… 1991 ๐Ÿ› Elsevier Science ๐ŸŒ English โš– 544 KB

The use of a thin titanium interlayer has been found to considerably improve the adhesion of titanium nitride coatings produced by physical vapour deposition (PVD). This is believed to arise from two factors: the dissolution of weak native oxide layers by the titanium (a chemical gettering effect) a