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Preparation of variable-thickness MgB2 thin film bridges by AFM nanolithography

✍ Scribed by M. Gregor; A. Plecenik; T. Plecenik; M. Tomasek; P. Kus; R. Micunek; M. Stefecka; M. Zahoran; B. Grancic; M. Kubinec; V. Gasparik


Publisher
Elsevier Science
Year
2006
Tongue
English
Weight
331 KB
Volume
435
Category
Article
ISSN
0921-4534

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✦ Synopsis


In this paper we focus our attention on preparation of superconducting MgB 2 thin films and variable-thickness MgB 2 thin film bridges using the Atomic Force Microscope nanolithographic technique. Microstructures and their following variable-thickness bridges were prepared on nonsuperconducting MgB thin films. Final structures were annealed in argon atmosphere at temperature 680 Β°C and exhibit transition to the superconducting state T con = 33 K and zero critical temperature T c0 = 30.5 K. Critical current density j c (4.2 K) measured on the bridge was higher than 10 6 A/cm 2 .


πŸ“œ SIMILAR VOLUMES


Preparation of MgB2 superconducting thin
✍ R. Mičunek; A. Plecenik; P. KΓΊΕ‘; M. Zahoran; M. TomΓ‘Ε‘ek; T. Plecenik; M. Gregor; πŸ“‚ Article πŸ“… 2006 πŸ› Elsevier Science 🌐 English βš– 383 KB

Superconductor MgB 2 thin films with thickness 200 nm were prepared on sapphire substrates by co-deposition of boron and magnesium. Precursor MgB thin films were deposited from two independent magnetron sources-boron by rf magnetron sputtering and magnesium by dc magnetron sputtering. MgB precursor