Superconductor MgB 2 thin films with thickness 200 nm were prepared on sapphire substrates by co-deposition of boron and magnesium. Precursor MgB thin films were deposited from two independent magnetron sources-boron by rf magnetron sputtering and magnesium by dc magnetron sputtering. MgB precursor
Preparation of variable-thickness MgB2 thin film bridges by AFM nanolithography
β Scribed by M. Gregor; A. Plecenik; T. Plecenik; M. Tomasek; P. Kus; R. Micunek; M. Stefecka; M. Zahoran; B. Grancic; M. Kubinec; V. Gasparik
- Publisher
- Elsevier Science
- Year
- 2006
- Tongue
- English
- Weight
- 331 KB
- Volume
- 435
- Category
- Article
- ISSN
- 0921-4534
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β¦ Synopsis
In this paper we focus our attention on preparation of superconducting MgB 2 thin films and variable-thickness MgB 2 thin film bridges using the Atomic Force Microscope nanolithographic technique. Microstructures and their following variable-thickness bridges were prepared on nonsuperconducting MgB thin films. Final structures were annealed in argon atmosphere at temperature 680 Β°C and exhibit transition to the superconducting state T con = 33 K and zero critical temperature T c0 = 30.5 K. Critical current density j c (4.2 K) measured on the bridge was higher than 10 6 A/cm 2 .
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