✦ LIBER ✦

Preparation of thin gold films by the forward-sputtering method

✍ Scribed by S. Nakao; K. Saitoh; M. Ikeyama; H. Niwa; S. Tanemura; Y. Miyagawa; S. Miyagawa

Publisher: Elsevier Science
Year: 1994
Tongue: English
Weight: 396 KB
Volume: 66
Category: Article
ISSN: 0257-8972
DOI: 10.1016/0257-8972(94)90050-7

No coin nor oath required. For personal study only.

📜 SIMILAR VOLUMES

Preparation of AgMo6S8 thin films by rea

Preparation of AgMo6S8 thin films by reactive sputtering

✍ G.B. Hertel; T.P. Orlando; J.M. Tarascon 📂 Article 📅 1985 🏛 Elsevier Science ⚖ 476 KB

Preparation of piezoelectric ZnO thin fi

Preparation of piezoelectric ZnO thin films by target-facing-type sputtering method

✍ Ken-ya Hashimoto; Syotaro Ogawa; Akinori Nonoguchi; Tatsuya Omori; Masatsune Yam 📂 Article 📅 2000 🏛 John Wiley and Sons 🌐 English ⚖ 231 KB 👁 1 views

This paper describes the deposition of high-quality zinc oxide (ZnO) thin film by reactive dc target-facing-type sputtering (DC-TFTS) using an arc killer that periodically applies a positive pulse to the negative dc discharge current. High-speed deposition of high-quality thin film, which is a merit

Preparation of MgB2 superconducting thin

Preparation of MgB2 superconducting thin films by magnetron sputtering

✍ R. Mičunek; A. Plecenik; P. Kúš; M. Zahoran; M. Tomášek; T. Plecenik; M. Gregor; 📂 Article 📅 2006 🏛 Elsevier Science 🌐 English ⚖ 383 KB

Superconductor MgB 2 thin films with thickness 200 nm were prepared on sapphire substrates by co-deposition of boron and magnesium. Precursor MgB thin films were deposited from two independent magnetron sources-boron by rf magnetron sputtering and magnesium by dc magnetron sputtering. MgB precursor

Fine structure of gold particles in thin

Fine structure of gold particles in thin films prepared by metal-insulator co-sputtering

✍ R.A. Roy; R. Messier; J.M. Cowley 📂 Article 📅 1981 🏛 Elsevier Science 🌐 English ⚖ 867 KB

The deposition of thin films of gold on

The deposition of thin films of gold on cylindrical specimens by sputtering

📂 Article 📅 1956 🏛 Elsevier Science 🌐 English ⚖ 221 KB

Preparation of aluminum thin films by th

Preparation of aluminum thin films by the facing targets sputtering system

✍ Toyoaki Hirata; Masao Nagakubo; Masahiko Naoe 📂 Article 📅 1991 🏛 Elsevier Science 🌐 English ⚖ 383 KB

The facing targets sputtering (FTS) system, typical of plasma-free sputtering systems, was used to deposit aluminum thin films composed of very fine grains with a smooth surface, large hardness and low resistivity. When the argon gas pressure PAr was as low as 10-' Pa, the aluminum films deposited a