Preparation of low resistivity tungsten thin films deposited by microwave-plasma-enhanced chemical vapour deposition from the tungsten hexafluoride-hydrogen system

✍ Scribed by A. Belkacem; Y. Arnal; J. Pelletier; E. André; J.C. Oberlin

• Publisher: Elsevier Science
• Year: 1994
• Tongue: English
• Weight: 311 KB
• Volume: 241
• Category: Article
• ISSN: 0040-6090
• DOI: 10.1016/0040-6090(94)90446-4