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Preparation of arsenic-doped Ge nanocrystals embedded in SiO2 film by ion implantation and thermal neutron irradiation

✍ Scribed by Shaobo Dun; Tiecheng Lu; Youwen Hu; Qiang Hu; Caofeng You; Ningkang Huang


Book ID
113792090
Publisher
Elsevier Science
Year
2008
Tongue
English
Weight
410 KB
Volume
62
Category
Article
ISSN
0167-577X

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