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Preparation of a nanosilica-modified negative-type acrylate photoresist

โœ Scribed by Dar-Jong Lin; Trong-Ming Don; Chin-Chung Chen; Bing-Yi Lin; Chih-Kang Lee; Liao-Ping Cheng

Publisher
John Wiley and Sons
Year
2007
Tongue
English
Weight
291 KB
Volume
107
Category
Article
ISSN
0021-8995

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๐Ÿ“œ SIMILAR VOLUMES

The kinetics of a negative-tone acrylic
The kinetics of a negative-tone acrylic photoresist for 193-nm lithography
โœ S. C. Fu; K. H. Hsieh ๐Ÿ“‚ Article ๐Ÿ“… 2000 ๐Ÿ› John Wiley and Sons ๐ŸŒ English โš– 220 KB

Polymethacrylates with tert-alcohol ester were synthesized as negativetone chemical amplification photoresists (CAMPs) for 193-nm microlithography. The acid-catalyzed dehydration reaction of the CAMPs was analyzed via Fourier transform infrared. The crosslinking behavior following the dehydration re