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Characterization of acrylic copolymers applied in negative-type photoresist via a ternary composition diagram

✍ Scribed by Chih-Kang Lee; Trong-Ming Don; Dar-Jong Lin; Chin-Chung Chen; Liao-Ping Cheng


Publisher
John Wiley and Sons
Year
2008
Tongue
English
Weight
185 KB
Volume
109
Category
Article
ISSN
0021-8995

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