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Preparation and properties of polyhedral oligomeric silsesquioxane polymers

✍ Scribed by Takahiro Shioda; Takahiro Gunji; Noritaka Abe; Yoshimoto Abe

Publisher
John Wiley and Sons
Year
2011
Tongue
English
Weight
199 KB
Volume
25
Category
Article
ISSN
0268-2605

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✦ Synopsis

Abstract

Polyhedral oligomeric silsesquioxane (POSS) polymers were synthesized by the dehydrogenative condensation of (HSiO~3/2~)~8~ with water in the presence of diethylhydroxylamine followed by trimethylsilylation. Coating films were prepared by spin‐coating of the coating solution prepared by the dehydrogenative condensation of POSS. The hardness of the coating films was evaluated using a pencil‐hardness test and was found to increase up to 8H with increases in the curing temperature. Free‐standing film and silica gel powder were prepared by aging the coating solution at room temperature. The silica gel powder was subjected to heat treatment under air atmosphere to show a specific surface area of 440 m^2^ g^−1^ at 100 °C, which showed a maximum at 400 °C as 550 m^2^ g^−1^. Copyright © 2011 John Wiley & Sons, Ltd.

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